Nano-crystalline Diamond Films for X-ray Lithography Mask
نویسندگان
چکیده
منابع مشابه
Fabrication of distortion free x-ray masks using low stress tungsten
X-ray lithography is an emerging technology for future integrated circuit fabrication for linewidth of O.5J.1.mor below. There are two main criterion of applying x-ray lithography in production: x-ray source and mask technology. At this time, x-ray mask fabrication presents the greatest challenge. The two main elements of a x-ray mask are the membrane and absorber. Ideally a good x-ray mask sho...
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